ChemX Materials (ASX:CMX) has been granted the HiPurA® patent in New Zealand, received A$191,935 (Tranche 2) via R&D tax incentive loan facility, and made progress in the construction of the HPA Pilot Plant. The company continues to solidify its competitive edge in the production of high purity alumina (HPA) and is focused on accelerating its commercialization strategy in key markets.
ChemX's Chief Executive Officer, Peter Lee, expressed the significance of the patent awards in underpinning the global rollout of ChemX's HiPurA® technology. He highlighted the company's anticipation of accelerating its commercialization strategy in key markets, including LEDs, semiconductors, and electrical vehicles. Additionally, he emphasized the expectation of receiving additional international patents over time.
ChemX Materials (ASX:CMX) has achieved a significant milestone with the grant of the HiPurA® patent in New Zealand, further strengthening its position as a key producer of high purity alumina. The company's progress in receiving R&D funding and advancing the construction of the HPA Pilot Plant demonstrates its commitment to driving innovation and commercialization. Despite delays in the construction process, ChemX has implemented enhanced safety measures and control systems, emphasizing its dedication to operational readiness and process optimization. Looking ahead, the company aims to deploy its patented HiPurA® process in suitable jurisdictions close to key markets and customers, supporting its vision to contribute to the clean energy transition and lower carbon emissions.